Physical Mechanism and Growth Kinetics of Thin Films Prepared by Sputtering and Evaporation Processes

<p>Sputtering and evaporation are two fundamental physical vapor deposition techniques, where film growth behavior is governed by the complex coupling of deposited particle energy, flux, and surface processes. Understanding the physical mechanisms and growth kinetics of these two techniques not only...

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Detalles Bibliográficos

Autores principales:	Xinli, Cheng, Hong, Liu
Formato:	Capítulo de libro
Lenguaje:	inglés
Publicado:	IntechOpen 2026
Materias:	Physical Sciences, Engineering and Technology
Acceso en línea:	https://www.intechopen.com/chapters/1245645
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!