O2/CH4 Kinetic Mechanisms for Aerospace Applications at Low Pressure and Temperature, Validity Ranges and Comparison
None
Guardado en:
| Autor principal: | |
|---|---|
| Formato: | Capítulo de libro |
| Lenguaje: | inglés |
| Publicado: |
IntechOpen
2011
|
| Materias: | |
| Acceso en línea: | https://www.intechopen.com/chapters/19536 |
| Etiquetas: |
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares: O2/CH4 Kinetic Mechanisms for Aerospace Applications at Low Pressure and Temperature, Validity Ranges and Comparison
- Preserving Proteins Under High Pressure and Low Temperature
- Pressure Inhomogeneities across Large Samples Using Gas Pressure Media at Low Temperatures
- Mechanical Properties and Performance of Titanium-Based Alloys Used in Aerospace Applications
- Low cost TVAC Chamber for aerospace tests
- Comparison of Intracranial Pressure by Lateral and Frontal Impacts - Validation of Computational Model
- Aerospace propulsion /