Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles

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Autores principales: Kaneko, Toshiro, Takahashi, Shohei, Hatakeyama, Rikizo
Formato: Capítulo de libro
Lenguaje:inglés
Publicado: IntechOpen 2013
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Acceso en línea:https://www.intechopen.com/chapters/40913
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author Kaneko, Toshiro
Takahashi, Shohei
Hatakeyama, Rikizo
author_browse Hatakeyama, Rikizo
Kaneko, Toshiro
Takahashi, Shohei
author_facet Kaneko, Toshiro
Takahashi, Shohei
Hatakeyama, Rikizo
author_sort Kaneko, Toshiro
building IntechOpen
collection Acceso abierto
description None
doi_str_mv 10.5772/52095
first_indexed 2026-10-16T13:39:57Z
format Book Chapter
fullrecord <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>intech-40913</identifier><datestamp>2013-01-23</datestamp> <dc:title>Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles</dc:title> <dc:creator>Toshiro Kaneko</dc:creator> <dc:creator>Shohei Takahashi</dc:creator> <dc:creator>Rikizo Hatakeyama</dc:creator> <dc:subject>Physical Sciences, Engineering and Technology</dc:subject> <dc:description>None</dc:description> <dc:publisher>IntechOpen</dc:publisher> <dc:date>2013-01-23</dc:date> <dc:type>Chapter, Part Of Book</dc:type> <dc:identifier>https://www.intechopen.com/chapters/40913</dc:identifier> <dc:identifier>doi:10.5772/52095</dc:identifier> <dc:language>en</dc:language> <dc:relation>ISBN:978-953-51-0937-2</dc:relation> <dc:rights>https://creativecommons.org/licenses/by/3.0/</dc:rights> <dc:source>https://www.intechopen.com/books/3178 ; Ionic Liquids - New Aspects for the Future</dc:source> </oai_dc:dc>
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institution IntechOpen
isbn 978-953-51-0937-2
language English
last_indexed 2026-10-16T13:39:57Z
publishDate 2013
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spelling intech-409132013-01-23 Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles Toshiro Kaneko Shohei Takahashi Rikizo Hatakeyama Physical Sciences, Engineering and Technology None IntechOpen 2013-01-23 Chapter, Part Of Book https://www.intechopen.com/chapters/40913 doi:10.5772/52095 en ISBN:978-953-51-0937-2 https://creativecommons.org/licenses/by/3.0/ https://www.intechopen.com/books/3178 ; Ionic Liquids - New Aspects for the Future
spellingShingle Physical Sciences, Engineering and Technology
Kaneko, Toshiro
Takahashi, Shohei
Hatakeyama, Rikizo
Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles
title Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles
title_full Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles
title_fullStr Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles
title_full_unstemmed Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles
title_short Plasma Process on Ionic Liquid Substrate for Morphology Controlled Nanoparticles
title_sort plasma process on ionic liquid substrate for morphology controlled nanoparticles
topic Physical Sciences, Engineering and Technology
url https://www.intechopen.com/chapters/40913
work_keys_str_mv AT kanekotoshiro plasmaprocessonionicliquidsubstrateformorphologycontrollednanoparticles
AT takahashishohei plasmaprocessonionicliquidsubstrateformorphologycontrollednanoparticles
AT hatakeyamarikizo plasmaprocessonionicliquidsubstrateformorphologycontrollednanoparticles