Crystalline Silicon Nitride Films on Si(111): Growth Mechanism, Surface Structure and Chemistry down to Atomic Scale
A detailed investigation of the growth mechanism of ultra-thin silicon nitride (Si3N4) films on Si(111) substrates, their structure, morphology and surface chemistry down to atomic scale have been investigated using various surface analytical techniques such as low energy electron diffraction (LEED)...
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| Formato: | Capítulo de libro |
| Lenguaje: | inglés |
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IntechOpen
2020
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| Acceso en línea: | https://www.intechopen.com/chapters/69377 |
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