High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure
None
Guardado en:
| Autor principal: | |
|---|---|
| Formato: | Capítulo de libro |
| Lenguaje: | inglés |
| Publicado: |
IntechOpen
2010
|
| Materias: | |
| Acceso en línea: | https://www.intechopen.com/chapters/8659 |
| Etiquetas: |
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares: High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure
- The Fabrication of High Aspect Ratio Nanostructures on Quartz Substrate
- Fabrication of High Aspect Ratio Microcoils for Electromagnetic Actuators
- UV-LEDs: Next-Generation Ultraviolet Light Sources
- Maximum Implied Variance Slope -- Practical Aspects
- Effects of UV-LED Irradiation on <em>E. coli</em> in Water Disinfection
- Design Space Exploration of Backside Clock Meshes for 2 nm GAAFET BSPDN Technology