Electrophysical Properties of Nanofilms Produced by Magnetron Sputtering Method
<p id="p1">In this chapter, we have measured the formation, surface morphology, elemental analysis, and electrophysical parameters of chromium disilicide thin films and silicon oxide films grown in a magnetron sputtering device by solid-phase ion plasma method. CrSi<sub>2</sub> thin films grown by t...
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| Format: | Book Chapter |
| Language: | English |
| Published: |
IntechOpen
2024
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| Online Access: | https://www.intechopen.com/chapters/1174794 |
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