Electrophysical Properties of Nanofilms Produced by Magnetron Sputtering Method

<p id="p1">In this chapter, we have measured the formation, surface morphology, elemental analysis, and electrophysical parameters of chromium disilicide thin films and silicon oxide films grown in a magnetron sputtering device by solid-phase ion plasma method. CrSi₂ thin films grown by t...

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Autor principal:	Turakulovich, Dovranov Kuvondik
Formato:	Capítulo de libro
Lenguaje:	inglés
Publicado:	IntechOpen 2024
Materias:	Physical Sciences, Engineering and Technology
Acceso en línea:	https://www.intechopen.com/chapters/1174794
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