Dynamic Finite Element Analysis on Underlay Microstructure of Cu/low-k Wafer during Wirebonding

The aim of present research is to investigate dynamic stress analysis for microstructure of Cu/Low-K wafer subjected to wirebonding predicted by finite element software ANSYS/LS-DYNA. Two major analyses are conducted in the present research. In the first, the characteristic of heat affected zone (HA...

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Autores principales: Hsu, Hsiang-Chen, Hu, Chin-Yuan, Chang, Wei-Yao, Yeh, Chang-Lin, Lai, Yi-Shao
Formato: Capítulo de libro
Lenguaje:inglés
Publicado: IntechOpen 2010
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Acceso en línea:https://www.intechopen.com/chapters/12101
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