Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications

The wide range of cryogenic applications, such as spatial, high performance computing or high-energy physics, has boosted the investigation of CMOS technology performance down to cryogenic temperatures. In particular, the readout electronics of quantum computers operating at low temperature requires...

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Autores principales: Cassé, Mikaël, Ghibaudo, Gérard
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Publicado: IntechOpen 2021
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Acceso en línea:https://www.intechopen.com/chapters/77021
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author Cassé, Mikaël
Ghibaudo, Gérard
author_browse Cassé, Mikaël
Ghibaudo, Gérard
author_facet Cassé, Mikaël
Ghibaudo, Gérard
author_sort Cassé, Mikaël
building IntechOpen
collection Acceso abierto
description The wide range of cryogenic applications, such as spatial, high performance computing or high-energy physics, has boosted the investigation of CMOS technology performance down to cryogenic temperatures. In particular, the readout electronics of quantum computers operating at low temperature requires larger bandwidth than spatial applications, so that advanced CMOS node has to be considered. FDSOI technology appears as a valuable solution for co-integration between qubits and consistent engineering of control and read-out. However, there is still lack of reports on literature concerning advanced CMOS nodes behavior at deep cryogenic operation, from devices electrostatics to mismatch and self-heating, all requested for the development of robust design tools. For these reasons, this chapter presents a review of electrical characterization and modeling results recently obtained on ultra-thin film FDSOI MOSFETs down to 4.2 K.
doi_str_mv 10.5772/intechopen.98403
first_indexed 2026-10-15T21:38:51Z
format Book Chapter
fullrecord <oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><identifier>intech-77021</identifier><datestamp>2021-06-07</datestamp> <dc:title>Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications</dc:title> <dc:creator>Mikaël Cassé</dc:creator> <dc:creator>Gérard Ghibaudo</dc:creator> <dc:subject>Physical Sciences, Engineering and Technology</dc:subject> <dc:description>The wide range of cryogenic applications, such as spatial, high performance computing or high-energy physics, has boosted the investigation of CMOS technology performance down to cryogenic temperatures. In particular, the readout electronics of quantum computers operating at low temperature requires larger bandwidth than spatial applications, so that advanced CMOS node has to be considered. FDSOI technology appears as a valuable solution for co-integration between qubits and consistent engineering of control and read-out. However, there is still lack of reports on literature concerning advanced CMOS nodes behavior at deep cryogenic operation, from devices electrostatics to mismatch and self-heating, all requested for the development of robust design tools. For these reasons, this chapter presents a review of electrical characterization and modeling results recently obtained on ultra-thin film FDSOI MOSFETs down to 4.2 K.</dc:description> <dc:publisher>IntechOpen</dc:publisher> <dc:date>2021-06-07</dc:date> <dc:type>Chapter, Part Of Book</dc:type> <dc:identifier>https://www.intechopen.com/chapters/77021</dc:identifier> <dc:identifier>doi:10.5772/intechopen.98403</dc:identifier> <dc:language>en</dc:language> <dc:relation>ISBN:978-1-83968-584-2</dc:relation> <dc:rights>https://creativecommons.org/licenses/by/3.0/</dc:rights> <dc:source>https://www.intechopen.com/books/9889 ; Low-Temperature Technologies and Applications</dc:source> </oai_dc:dc>
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spelling intech-770212021-06-07 Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications Mikaël Cassé Gérard Ghibaudo Physical Sciences, Engineering and Technology The wide range of cryogenic applications, such as spatial, high performance computing or high-energy physics, has boosted the investigation of CMOS technology performance down to cryogenic temperatures. In particular, the readout electronics of quantum computers operating at low temperature requires larger bandwidth than spatial applications, so that advanced CMOS node has to be considered. FDSOI technology appears as a valuable solution for co-integration between qubits and consistent engineering of control and read-out. However, there is still lack of reports on literature concerning advanced CMOS nodes behavior at deep cryogenic operation, from devices electrostatics to mismatch and self-heating, all requested for the development of robust design tools. For these reasons, this chapter presents a review of electrical characterization and modeling results recently obtained on ultra-thin film FDSOI MOSFETs down to 4.2 K. IntechOpen 2021-06-07 Chapter, Part Of Book https://www.intechopen.com/chapters/77021 doi:10.5772/intechopen.98403 en ISBN:978-1-83968-584-2 https://creativecommons.org/licenses/by/3.0/ https://www.intechopen.com/books/9889 ; Low-Temperature Technologies and Applications
spellingShingle Physical Sciences, Engineering and Technology
Cassé, Mikaël
Ghibaudo, Gérard
Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
title Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
title_full Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
title_fullStr Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
title_full_unstemmed Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
title_short Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications
title_sort low temperature characterization and modeling of fdsoi transistors for cryo cmos applications
topic Physical Sciences, Engineering and Technology
url https://www.intechopen.com/chapters/77021
work_keys_str_mv AT cassemikael lowtemperaturecharacterizationandmodelingoffdsoitransistorsforcryocmosapplications
AT ghibaudogerard lowtemperaturecharacterizationandmodelingoffdsoitransistorsforcryocmosapplications