Nanometric 3D Printing of Functional Materials by Atomic Layer Deposition

Atomic layer deposition (ALD) is a chemical vapour deposition (CVD) method that allows the layer-by-layer growth of functional materials by exposing a surface to different precursors in an alternative fashion. Thus, thanks to gas-solid reactions that are substrate-limited and self-terminating, preci...

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Detalles Bibliográficos

Autores principales:	Muñoz-Rojas, David, Weber, Matthieu, Vallée, Christophe, Crivello, Chiara, Sekkat, Abderrahime, Toldra-Reig, Fidel, Bechelany, Mikhael
Formato:	Capítulo de libro
Lenguaje:	inglés
Publicado:	IntechOpen 2022
Materias:	Physical Sciences, Engineering and Technology
Acceso en línea:	https://www.intechopen.com/chapters/80053
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