Hafnium-based High-k Gate Dielectrics

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Bibliographic Details
Main Authors: Huang, A. P., Yang, Z. C., Chu, Paul K.
Format: Book Chapter
Language:English
Published: IntechOpen 2010
Subjects:
Online Access:https://www.intechopen.com/chapters/9848
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Description
Summary:None
ISBN:978-953-307-086-5
DOI:10.5772/8631