Optimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-Beam Lithography
None
Guardado en:
| Autor principal: | |
|---|---|
| Formato: | Capítulo de libro |
| Lenguaje: | inglés |
| Publicado: |
IntechOpen
2010
|
| Materias: | |
| Acceso en línea: | https://www.intechopen.com/chapters/8671 |
| Etiquetas: |
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares: Optimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-Beam Lithography
- Fabrication of Binary Diffractive Lens on Optical Films by Electron Beam Lithography
- High-energy Electron Beam Lithography for Nanoscale Fabrication
- Dopant Driven Electron Beam Lithography
- Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography
- Independent-Exposure Method in Electron-Beam Lithography
- Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch